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Extra resources for 2600 The hacker quarterly (summer 2007, vol. 24 №2)
Frtlncis Alkoxides of most metals can be synthesized'? , volatility, solubility, hydrolysis rate) and therefore their utility in sol-gel processes. g.. )or polymeric solids to lessen the polarity. g.. Si, Sn) tend to be monomeric and more volatile. The alkyl group also influences properties. Ix An Metal alkoxides react with waterto form metal-hydroxyl (M-OH) bonds. example of such a hydrolysis reaction for a Si alkoxide is shown in Figure 2a. The reverse reaction, esterfication, will occur in some instances.
Must ~ be used in combination with alkoxide components, because the alkoxy groups are necessary for the hydrolysis and condensation reactions which form the polymeric gel network. Nitrates are viable candidates, because they have high solubilities and decompose cleanly. example, Li and Thompson2'Jused AI(NO,), 9 H,O with TEOS to prepare mullite. "Other salts, such chlorides, havea stable anion which can contaminatethe final ceramic. Metalorganic salts, in particular acetates, have been used in several systems.
However, only hydrocarbon contamination is removed at room temperature by H bombardment. NH, plasma produces excessive H,O by reacting with pyrex reactor walls and promotes oxide formation. 7 Plasma Hydrogenation Plasma hydrogenation is used to clean heavily doped p+ Si surfaces prior to the selective deposition of W by CVD process. A clean Sisurface is essential for a stable metal/silicon interfacefor VLSI electrodes. 8 Plasma Etching Plasma etching is a dry etching technique required to remove GaAs from AlGaAs or InGaAs surface.
2600 The hacker quarterly (summer 2007, vol. 24 №2)